|SUBJECT:||M.S. Thesis Presentation|
|TIME:||Wednesday, April 26, 2017, 9:00 a.m.|
|PLACE:||Love Building, 109|
|TITLE:||Real-time Monitoring of Exposure Controlled Projection Lithography (ECPL) process|
|COMMITTEE:||Dr. David W. Rosen, Chair (ME)
Dr. Amit S. Jariwala (ME)
Dr. Suresh K. Sitaraman (ME)
Exposure Controlled Projection Lithography (ECPL) is a stereolithographic based additive manufacturing process in which photopolymer resin is used to fabricate lens shaped features. During this process, a dynamic mask projects radiation patterns through a transparent substrate onto the photopolymer resin to grow features from the substrate surface. The Interferometric Cure Monitoring (ICM) system utilizes the principle of Mach-Zehnder interferometer to measure the change in refractive index of the photopolymer resin.