|SUBJECT:||M.S. Thesis Presentation|
|TIME:||Friday, August 19, 2016, 11:00 a.m.|
|PLACE:||MRDC Building, 3515|
|TITLE:||Empirical Process Planning for Exposure Controlled Projection Lithography|
|COMMITTEE:||Dr. David Rosen, Chair (ME)
Dr. Jonathan Colton (ME)
Dr. Amit Jariwala (ME)
The stereolithography (SLA) process is a rapid prototyping technique in which a solid physical model of a part is made directly from a three-dimensional CAD by repeatedly exposing ultraviolet light at certain regions with a liquid photopolymer resin bath. It is based on the principle of curing (hardening) a liquid photopolymer into a specific shape. The Exposure Controlled Projection Lithography (ECPL) process is developed based on SLA as a method to fabricate precise microstructure for micro-optics’ application. In the ECPL process, ultraviolet light patterned by a dynamic mask passes through a transparent substrate to cure liquid photopolymer resin into a desired shape. The dimensions of the part can be controlled by the exposure time and functional pixels in the dynamic mask.