|SUBJECT:||M.S. Thesis Presentation|
|TIME:||Tuesday, October 30, 2012, 12:00 p.m.|
|PLACE:||MARC Building, 201|
|TITLE:||Quantitative Metallography Tracking and Analysis for the Scanning Laser Epitaxy Process|
|COMMITTEE:||Dr. Suman Das, Chair (ME)
Dr. Arun Gokhale (MSE)
Dr. Yan Wang (ME)
This thesis involves the development of digital algorithms for the microstructural analysis of metallic deposits produced through the use of Scanning Laser Epitaxy (SLE). SLE is a new direct digital manufacturing (DDM) technique which allows for the creation of three dimensional nickel-based superalloy components using an incremental layering system. Using a bed of powder placed on an underlying substrate and a laser propagating a melt-pool across the sample, a layer of material can be added and through the careful control of SLE settings various microstructures can be created or extended from the substrate. To create parts that are within specified microstructure tolerances the ideal SLE settings must be located through experimental runs, with each material needing different operating parameters. This thesis focuses on improving the microstructural analysis by use of a program that tracks various features found in samples produced through the SLE technique and a data analysis program that provides greater insights into how the SLE settings influence the microstructure. Using this program the isolation of optimal SLE settings is faster while also providing greater insights into the process than is currently possible.